MATRICS X9ULTRA Series
Features
A mask inspection system designed for pellicle-less EUV mask inspection in the technology nodes of 3nm and beyond
Improved minute particle detection performance through the adoption of high-power 193nm laser and high-NA objective lens
Applications
Quality assurance inspection of pellicle-less EUV masks at wafer fabs
Minute particle inspection in EUV mask manufacturing processes
Our photomask inspection system, the MATRICS X810EX series and X8ULTRA series, have received high evaluation and are widely used at wafer fabs and mask shops worldwide for their excellent inspection performance, low running costs, and high reliability.
We have commercialized the X9ULTRA series, which further improves the minute particle inspection performance on pellicle-less EUV masks compared to conventional systems.
In the semiconductor device market, demand continues to grow for 5G, HPC, high-performance servers, and other applications, and the use of EUV lithography is expanding in semiconductor device manufacturing processes. Lasertec commercialized the X8ULTRA series in 2018 for detecting minute particles on EUV masks, and it has been highly acclaimed as an inspection system for pellicle-less EUV masks. The newly announced X9ULTRA series further improves minute particle detection performance compared to conventional models by adopting a newly developed in-house high-power 193nm laser light source and high-NA objective lens.
