PELMIS Series
Features
Inspection and automatic front/back surface discrimination of particles adhering to the pellicle surface of pellicle-mounted EUV masks
In addition to the pellicle surface, also supports particle inspection of mask pattern surfaces and pattern peripheral areas
Die-to-die comparison inspection and mask-to-mask comparison inspection are also possible
Applications
Particle inspection and regular quality management inspection of EUV pellicles and mask pattern surfaces in wafer fabs
Particle inspection in EUV mask manufacturing processes in mask shops
As the EUV market expands, the demand for EUV pellicle inspection is increasing. The newly commercialized PELMIS Series has achieved particle inspection of the pellicle surface of pellicle-mounted EUV masks and automatic classification of attached particles by front and back surfaces. It also supports particle inspection of pattern surfaces and pattern peripheral areas, making it a versatile equipment.
In the inspection process of EUV pellicle-mounted masks after pellicle installation, when used in combination with actinic※2 EUV pattern mask defect inspection equipment ACTIS Series, EUV mask backside inspection/cleaning equipment BASIC Series, and mask edge inspection equipment MZ Series, comprehensive inspection of EUV masks can be achieved, and further optimization of productivity is expected.
